Mist City Arts and Science University.
At the research base center, inside the photolithography machine research project building.
Tong Yihang, Liu Tiefei, Luo Peng, and Su Beilin, among others, are tirelessly working day and night in this building. The breakthrough of 3 nanometer chip technology process photolithography machine and its supporting industry technology has become the biggest challenge they now face.
Of course.
Tong Yihang and Luo Peng have already overcome many challenges, but there is still some time before the birth of the 3 nanometer process photolithography machine.
In fact, Tong Yihang and the others understand that this year, they must develop the 3 nanometer chip process photolithography machine; otherwise, by next year, foreign competitors might either catch up or start mass production of 3 nanometer chips ahead of them. Strategically, they would already have lost by then.
